Surface Science
Scanning Probe Microscopy
X-Ray Diffraction
Nuclear Magnetic Resonance
Thin Film
Optical Characterisation
Electrical/Magnetic Characterisation
Thermal Analysis
Sample Preparation-General
Sample Preparation-Electron_Microscopy
Element Analysis
Nano Fabrication
Liquid Helium Plant
Scanning Electron Microscopy-SEM
Transmission Electron Microscopy-TEM
UV Direct Writer
Model:
TTT-07-UV (Tuo Tuo Technology)
Status:
Operational
Location:
2145
Description:
1. Grayscale exposure; 2.Flexible pattern design;3.Minimum critical dimension: 1um 4.Light source: 405 nm UV; 5.Exposure speed: 3 mm2/min@1um; 20 mm2/min@1.5um; 6.Overlay accuracy: 350nm; 7.Sample size: 3 mm × 3 mm to 6-inch wafer
Link:
https://www.mcpf.hkust.edu.hk/sqlrequest/PO/Direct%20Writer-Specification.PDF
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