Focused Ion Beam (I)
SMI 2050 (W) (SII Nanotechnology Inc.)
The SII SMI2050 FIB system is a nanofabrication tool which combines all available FIB applications and automation of a full lithography system. Accelerating voltage at 30keV only. 2 lines gas injection system (GIS).
1) Max 3 sessions per week and 6 sessions for 3 weeks booking in advance 2) lunch ONLY for exchange samples 3) 2 days cancellation 4) Excess booking will be cancelled--- Violation the rules will be disqualified