Nuclear Magnetic Resonance
E-beam for metal
Model:
IVS EB-500M
Status:
Operational
Location:
2145
Description:
Dedicated to metal thin film deposition • Wafer numbers / Sizes: 6 pcs / 4" • Film thickness uniformity control under ±5% • Evaporation materials available: Au, Pd, Ti, Cr, Nb and Pt