Spin Coater and Hot Plate
Description:
For spinning coating photoresist and baking processes.
Hot Plate: 20 to 250oC heating with precise control.
Spin Coater:
• Speed Range: 0 to 6,000 rpm
• Speed Time : 0 to 999 sec
• Substrate Size : > 10 mm2 to 4" square
Technology: NanoScience and Engineering